Method and apparatus for dynamic model building based on machine disturbances for run-to-run control of semiconductor devices
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United States of America Patent
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Jun 10, 2003
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app pub date -
Aug 10, 1999
filing date -
Aug 10, 1999
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Abstract
The present invention provides a method and apparatus for correction of machine disturbances for run-to-run control of semiconductor device manufacturing processes. At least one external variable is identified. How the external variable impacts a semiconductor device manufacturing process is determined. A determination whether the impact of the external variable causes an appreciable impact on the semiconductor device manufacturing process is made. At least one control parameter of the semiconductor device manufacturing process is adjusted in response to the determination that the impact of the external variable causes an appreciable impact on the semiconductor device manufacturing process.
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