Ion implantation system and control method

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United States of America Patent

PATENT NO 7528550
APP PUB NO 20070176115A1
SERIAL NO

11648282

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Abstract

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at the aperture while maintaining conditions that limit the transverse kinetic energy of the ions to less than about 0.7 eV. The beam is transported to a target surface and the ions of the transported ion beam are implanted into the target.

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Patent Owner(s)

  • SEMEQUIP, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cohen, Brian C San Clemente, US 4 79
Horsky, Thomas N Boxborough, US 57 2580
Krull, Wade A Marblehead, US 14 498
Sacco,, Jr George P Wakefield, US 6 107

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