On stack overlay improvement for 3D NAND

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11276569
APP PUB NO 20200043723A1
SERIAL NO

16515230

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Embodiments described herein relate to manufacturing layer stacks of oxide/nitride (ON) layers with minimized in-plane distortion (IPD) and lithographic overlay errors. A method of forming a layer stack ON layers includes flowing a first silicon-containing gas, an oxygen-containing gas, and a first dilution gas. A RF power is symmetrically applied to form a first material layer of SiO2. A second silicon-containing gas, a nitrogen-containing gas, and a second dilution gas are flowed. A second RF power is symmetrically applied to form a second material layer of Si3N4. The flowing the first silicon-containing gas, the oxygen-containing gas, and the first dilution gas, the symmetrically applying the first RF power, the flowing the second silicon-containing gas, the nitrogen-containing gas, and the second dilution gas, and the symmetrically applying the second RF power is repeated until a desired number of first material layers and second material layers make up a layer stack.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • APPLIED MATERIALS INC.

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bansal, Amit Kumar Milpitas, US 74 773
Gung, Tza-Jing San Jose, US 72 809
Han, Xinhai Santa Clara, US 55 1184
Lin, Yongjing San Jose, US 24 56
Ogata, Masaki San Jose, US 21 149
Padhi, Deenesh Sunnyvale, US 140 4822
Rocha, Juan Carlos San Carlos, US 19 364
Srinivasan, Mukund Fremont, US 59 1418
Zhou, Yusheng Sunnyvale, US 6 162

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Sep 15, 2025
7.5 Year Payment $3600.00 $1800.00 $900.00 Sep 15, 2029
11.5 Year Payment $7400.00 $3700.00 $1850.00 Sep 15, 2033
Fee Large entity fee small entity fee micro entity fee
Surcharge - 3.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00