Method of cleaning a substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11495475
APP PUB NO 20200176281A1
SERIAL NO

16780049

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Various methods of cleaning a substrate are provided. In one aspect, method of cleaning a substrate, comprising: holding and rotating a substrate by a substrate holder; and supplying a chemical liquid to a chemical liquid nozzle and supplying two fluids to a two-fluid nozzle while moving the chemical-liquid nozzle and the two-fluid nozzle radially outwardly from the center to the periphery of the substrate, wherein the distance of the chemical-liquid nozzle from a rotating axis of the substrate holder is longer than the distance of the two-fluid nozzle from the rotating axis of the substrate holder while the chemical-liquid nozzle and the two-fluid nozzle are moved radially outwardly from the rotating axis of the substrate holder.

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Patent Owner(s)

  • EBARA CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Imai, Masayoshi Tokyo, JP 15 75
Maeda, Koji Tokyo, JP 160 1538
Nakano, Hisajiro Tokyo, JP 21 33
Shimomoto, Hiroshi Tokyo, JP 12 62
Shiokawa, Yoichi Tokyo, JP 28 146

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