Phase modulators in alignment to decrease mark size
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United States of America Patent
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Oct 31, 2023
Grant Date -
Dec 15, 2022
app pub date -
Aug 5, 2020
filing date -
Aug 9, 2019
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Abstract
An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.
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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
ASML NETHERLANDS B V | DE RUN 6501 VELDHOVEN NL-5504 DR |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Bijnen, Franciscus Godefridus Casper | Valkenswaard, NL | 44 | 314 |
Den, Boef Arie Jeffrey | Waalre, NL | 256 | 4400 |
Eralp, Muhsin | Bethel, US | 6 | 5 |
Huisman, Simon Reinald | Eindhoven, NL | 36 | 49 |
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