Photoresist layers of semiconductor components including electric fields, system, and methods of forming same

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United States of America Patent

PATENT NO 11817293
APP PUB NO 20210217583A1
SERIAL NO

17146300

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Abstract

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Photoresist layers of semiconductor components including electric fields. The photoresist layer may include a body including a first portion disposed directly over a conductive layer of the semiconductor component. The body may also include a second portion integrally formed with and positioned over the first portion. The second portion may include a surface formed opposite the first portion. Additionally, the second portion may include a plurality of charged-particles implanted therein, where the plurality of charged-particles generating an electric field may extend through the first portion and the second portion of the body.

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Patent Owner(s)

  • THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Denbeaux, Gregory Albany, US 4 3

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