Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
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United States of America Patent
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May 17, 2005
Grant Date -
Nov 27, 2003
app pub date -
May 23, 2002
filing date -
May 23, 2002
priority date (Note) -
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Abstract
New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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