Thermoplastic polyurethane foam, process for production thereof and polishing pads made of the foam
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United States of America Patent
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Dec 27, 2005
Grant Date -
Mar 18, 2004
app pub date -
Dec 5, 2001
filing date -
Dec 8, 2000
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention aims to provide a polyurethane foam, suitably usable as a polishing pad, having a uniform foam structure, which can achieve the improvements in the flatness of the surface of polished materials and in the planarization efficiency, and can extend the polishing pad life longer than that of the conventional polyurethane foams. This aim can be achieved by providing a polyurethane foam having a density of 0.5 to 1.0 g/cm3, a cell size of 5 to 200 μm and a hardness [JIS-C hardness] of not less than 90, comprising a thermoplastic polyurethane which is obtained by a reaction of a high polymer polyol, an organic diisocyanate and a chain extender, contains not less than 6% by weight of a nitrogen atom derived from the isocyanate group, and has a storage elastic modulus measured at 50° C. [E′50] of not less than 5×109 dyn/cm2.
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