Polysilicon control etch-back indicator
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United States of America Patent
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Dec 15, 2009
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N/A
app pub date -
Apr 29, 2006
filing date -
Apr 29, 2006
priority date (Note) -
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Abstract
This invention discloses a semiconductor wafer for manufacturing electronic circuit thereon. The semiconductor substrate further includes an etch-back indicator that includes trenches of different sizes having polysilicon filled in the trenches and then completely removed from some of the trenches of greater planar trench dimensions and the polysilicon still remaining in a bottom portion in some of the trenches having smaller planar trench dimensions.
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