Low contamination chamber for surface activation

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United States of America Patent

PATENT NO 11508562
APP PUB NO 20160181073A1
SERIAL NO

15055243

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An embodiment low contamination chamber includes a gas inlet, an adjustable top electrode, and an adjustable bottom electrode. The low contamination chamber is configured to adjust a distance between the adjustable top electrode and the adjustable bottom electrode in response to a desired density of plasma and a measured density of plasma measured between the adjustable top electrode and the adjustable bottom electrode during a surface activation process. The low contamination chamber further includes an outlet.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chao, Lan-Lin Sindian, TW 87 1860
Huang, Xin-Hua Xihu Township, TW 69 1040
Liu, Ping-Yin Yonghe, TW 106 1710
Tseng, Lee-Chuan New Taipei, TW 60 166

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