High resolution wafer inspection system

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7714999
APP PUB NO 20080231845A1
SERIAL NO

11952010

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method for inspecting a region, including irradiating the region via an optical system with a pump beam at a pump wavelength. A probe beam at a probe wavelength irradiates the region so as to generate returning probe beam radiation from the region. The beams are scanned across the region at a scan rate. A detector receives the returning probe radiation, and forms an image of the region that corresponds to a resolution better than pump and probe Abbe limits of the optical system. Roles of the pump and probe beams may be alternated, and a modulation frequency of the pump beam may be changed, to produce more information. Information extracted from the probe signal can also differentiate between different materials on the region.

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Patent Owner(s)

  • APPLIED MATERIALS ISRAEL, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Feldman, Haim Ayalon, IL 46 362
Grossman, Dan Herzelia, IL 6 21
Kris, Roman Jerusalem, IL 19 30
Langer, Moshe Nes-Ziona, IL 10 154
Naftali, Ron Shoham, IL 46 470
Reinhorn, Silviu Mevaseret-Zion, IL 31 773

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