Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7116403
SERIAL NO

10876772

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Lithographic apparatus providing a patterned beam of radiation in which radiation that is linearly polarized in a first direction has a first pattern and radiation that is linearly polarized in an orthogonal direction has a second pattern.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Troost, Kars Zeger Waalre, NL 33 477
Van, Der Mast Karel Diederick Helmond, NL 28 858

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