System and methods for thermally conditioning a wafer in a charged particle beam apparatus

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United States of America Patent

PATENT NO 11804358
SERIAL NO

17493837

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Abstract

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An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN 5504 DR

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gosen, Jeroen Gerard Veldhoven, NL 17 53
Van, Heumen Martijn Petrus Christianus Santa Clara, US 13 29

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