Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jul 20, 2010
Grant Date -
Sep 20, 2007
app pub date -
Mar 20, 2006
filing date -
Mar 20, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
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Cited Art Landscape
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