Electron beam apparatus and high-voltage discharge prevention method

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United States of America Patent

PATENT NO 7274017
APP PUB NO 20050218777A1
SERIAL NO

11137445

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.

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Patent Owner(s)

  • HITACHI HIGH-TECHNOLOGIES CORPORATION;HITACHI SCIENCE SYSTEMS, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirane, Kenichi Hitachi, JP 7 59
Kimura, Masashi Tokai-mura, JP 41 294
Nakayama, Yoshihiko Hitachinaka, JP 27 376
Okura, Akimitsu Hitachinaka, JP 9 156

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