Oxide-based flexible high voltage thin film transistor

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United States of America

PATENT NO 11322622
APP PUB NO 20210005753A1
SERIAL NO

16981464

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Abstract

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Embodiments are directed to a flexible high voltage thin film transistor (f-HVTFT) with a center-symmetric circular configuration. The f-HVTFT includes a ring-shaped oxide semiconductor channel, a ring-shaped gate, a ring-shaped source, and a circular drain. The source and gate each have multiple connections to respective electrode pads, enabling stable and identical electrical characteristics and blocking voltage while the f-HVTFT is subject to bending from random directions. The f-HVTFT enables a high blocking voltage over 100 V, on-current over 100 μA, and low off-current of 0.1 pA, which makes it suitable for power management of self-powered wearable electronic systems.

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Patent Owner(s)

  • RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Du, Xiaolong Beijing, CN 16 8
Hong, Wen-Chiang Piscataway, US 8 0
Lu, Yicheng Piscataway, US 43 525
Mei, Zengxia Beijing, CN 3 1
Zhang, Yonghui Beijing, CN 39 144

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