Substrate processing apparatus
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United States of America Patent
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Oct 19, 2004
Grant Date -
Apr 18, 2002
app pub date -
Oct 10, 2001
filing date -
Oct 13, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Reaction products produced under dry etching attach to a substrate undergoing dry etching. It is necessary to remove the reaction products for the next step. Therefore, in the case of the background art, the processing of supplying a remover for reaction products, an intermediate rinse for washing away the remover, and deionized water to a substrate in order is performed. The above processing is conventionally performed under an atmospheric atmosphere. Therefore, a thin film may be changed in quality due to atmospheric components. Therefore, a substrate processing apparatus of the present invention uses means for blowing nitrogen gas on a substrate and supplies a remover to the substrate while blowing nitrogen. Thereby, it is possible to prevent a thin film from being changed in quality due to atmospheric components.
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