Processes for pattern formation using photosensitive compositions and liquid development
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United States of America Patent
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Jul 22, 1997
Issued Date -
N/A
app pub date -
Nov 6, 1995
filing date -
Apr 16, 1993
priority date (Note) -
Expired
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Abstract
A photosensitive composition which comprises, as essential components: (A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxy group(s) and (A') a polymer having hydroxyphenyl group(s), (B) a compound having at least two vinyl ether groups in the molecule, and (C) a compound which generates an acid when irradiated with am actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.
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