Exposure method and apparatus
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United States of America Patent
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Mar 12, 1996
Issued Date -
N/A
app pub date -
May 25, 1995
filing date -
May 21, 1992
priority date (Note) -
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Abstract
Disclosed is an exposure method and apparatus for exposing a substrate by use of a pattern having a phase shift device, wherein the amount of phase shift with the phase shift device can be changed by changing the humidity of an ambient gas of the pattern.
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