Apparatus and method for providing fluid for immersion lithography
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United States of America Patent
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Aug 27, 2013
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N/A
app pub date -
Aug 5, 2009
filing date -
Sep 3, 2003
priority date (Note) -
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Abstract
A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including a chamber to hold liquid and having an open end adjacent to a volume in which fluid will be present. The open end removes, through a pressure differential across-the open end when liquid is present in the chamber, substantially only liquid from the volume when liquid in the volume is adjacent to the open end but not gas from the volume when gas in the volume is adjacent to the open end.
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