Incrementally resolved phase-shift conflicts in layouts for phase-shifted features

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United States of America Patent

PATENT NO 7281226
APP PUB NO 20030135839A1
SERIAL NO

10377341

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.

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Patent Owner(s)

  • SYNOPSYS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Yao-Ting Atherton, CA 80 2970
Wu, Shao-Po Portola Valley, CA 18 566

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