Method and apparatus for inspecting a pattern formed on a substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6900888
APP PUB NO 20040124363A1
SERIAL NO

10650756

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.

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Patent Owner(s)

  • HITACHI HIGH-TECHNOLOGIES CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maeda, Shunji Yokohama, JP 206 4648
Okabe, Takafumi Yokohama, JP 35 800
Sakai, Kaoru Yokohama, JP 67 1064
Shimoda, Atsushi Hiratsuka, JP 36 384
Watanabe, Masahiro Yokohama, JP 556 6806
Yoshida, Minoru Yokohama, JP 409 5557

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