Positive resist composition and patterning process

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United States of America Patent

PATENT NO 8808966
APP PUB NO 20130029269A1
SERIAL NO

13557900

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Abstract

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A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR22)m—, B is —(CR52)n—, R2 and R5 are hydrogen or alkyl, m and n are 1 or 2, R3 is alkyl, alkenyl, alkynyl or aryl, R6 is alkyl, alkoxy, alkanoyl, alkoxycarbonyl, hydroxyl, nitro, aryl, halogen, or cyano, and p is 0 to 4.

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Patent Owner(s)

  • SHIN-ETSU CHEMICAL CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hasegawa, Koji Joetsu, JP 292 3133
Hatakeyama, Jun Joetsu, JP 650 7269

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