Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
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United States of America Patent
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Feb 24, 2009
Grant Date -
Jun 28, 2007
app pub date -
Dec 22, 2005
filing date -
Dec 22, 2005
priority date (Note) -
In Force
status (Latency Note)
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Abstract
in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).
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First Claim
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International Classification(s)
- G21G:CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURC....
- H05H:PLASMA TECHNIQUE
- A61N:ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY;....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
- C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
- C25F:PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIAL....
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