Optical proximity correction (OPC) technique using generalized figure of merit for photolithograhic processing
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United States of America Patent
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Dec 20, 2005
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N/A
app pub date -
Oct 1, 2003
filing date -
Oct 1, 2003
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Abstract
A method and associated computer program for making optical proximity corrections for a reticle layout topology. Edge segments of the reticle layout topology are manipulated to generate a corrected reticle layout accounting for optical distortions and, based on the corrected reticle layout, a plurality of individual figure of merit values are generated. A generalized figure of merit (GFOM) using the plurality of individual figure of merit values is then generated.
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