Plasmonic photoelectrochemical oxidation face mask

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United States of America Patent

PATENT NO 11844966
APP PUB NO 20210275838A1
SERIAL NO

17249503

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Abstract

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A breathing system for removing harmful contaminants, such as microbes and volatile organic compounds, is provided. The breathing system includes a face mask, an inhalation limb, and a plasmonic device. As a contaminated gas flows through an internal chamber of the plasmonic device, the contaminates are oxidized. Specifically, the internal chamber includes a source of photons spaced apart from the nanostructure. The nanostructure is coated in a plasmonic layer, including noble metal nanoparticles. The plasmonic layer is protected from oxidation through a photocatalyst layer disposed thereon.

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Patent Owner(s)

Patent OwnerAddress
MOLEKULE INC1301 FOLSOM ST SAN FRANCISCO CA 94103

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goswami, Dharendra Yogi Tampa, US 14 129
Goswami, Dilip Neeraj San Carlos, US 1 1

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