Focused ion beam deposition

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United States of America Patent

PATENT NO 7171918
APP PUB NO 20020197851A1
SERIAL NO

10209453

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Introducing at least one metal such as cobalt, molybdenum, metal carbonyl, tungsten, platinum, or other suitable metal to a focused ion beam. Introducing the focused ion beam to a substrate within a processing chamber. Forming at least one layer over a substrate. Applying heat to the layer by, for example, a laser.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gavish, Ilan Kamiel, IL 13 97
Greenzweig, Yuval Ramat Hasharon, IL 7 99

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