Structure and methodology for fabrication and inspection of photomasks
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United States of America Patent
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Apr 3, 2007
Grant Date -
Nov 9, 2006
app pub date -
May 5, 2005
filing date -
May 5, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask, method of designing, of fabricating, of designing, a method of inspecting and a system for designing the photomask. The photomask, includes: a cell region, the cell region comprising one or more chip regions, each chip region comprising a pattern of opaque and clear sub-regions corresponding to features of an integrated circuit chip and one or more kerf regions, each kerf region comprising a pattern of opaque and clear sub-regions corresponding to features of an integrated circuit kerf; a clear region formed adjacent to a side of a copy region, the copy region comprising opaque and clear sub-regions that are copies of at least a part of the cell region; and an opaque region between the clear region and the cell region.
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