Gas charging system for fill of gas storage and dispensing vessels
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United States of America Patent
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Jun 21, 2005
Grant Date -
Jan 27, 2005
app pub date -
Jul 23, 2003
filing date -
Jul 23, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus and method for charging a gas storage and dispensing vessel with gas to a predetermined pressure level, e.g., a gas to be employed in a semiconductor manufacturing operation such as a hydride, halide or organometallic reagent gas. In the gas charging, a source gas is liquefied, e.g., in a cryotrap, and then gasified in closed flow communication with the vessel to introduce the gas thereinto, and such liquefaction/gasification steps are carried out alternatively and repetitively, to charge the vessel in a step-wise, progressive fashion with gas, until a full fill state is achieved, with the contained gas at the predetermined pressure level.
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