Extreme ultra violet light source apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7732794
APP PUB NO 20080197298A1
SERIAL NO

12071250

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In an extreme ultra violet light source apparatus having a comparatively large output power for exposing, a solid target is supplied fast and continuously while heat dissipation for irradiation of a driver laser light is performed successfully. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target material supplying unit which coats a wire with target material, a wire supplying unit which supplies the wire coated with the target material to a predetermined position within the chamber, a driver laser which applies a laser beam onto the wire coated with the target material to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputting the extreme ultra violet light.

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Patent Owner(s)

  • GIGAPHOTON INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abe, Tamotsu Odawara, JP 53 842
Ueno, Yoshifumi Hiratsuka, JP 66 654
Yabu, Takayuki Hiratsuka, JP 64 535

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