Method and apparatus for polymer coating of substrates

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United States of America Patent

PATENT NO 5545440
SERIAL NO

08349640

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A process for coating a surface of a substrate with a polymer material. The process includes heating a polymer to a preselected temperature such that the polymer, if solid, is in a liquid state or if liquid in a less viscous state to form a polymer solution. The polymer solution may contain other components such as a carrier in addition to the polymer. The polymer solution is heated to a preselected temperature below the flashpoint temperature of the polymer solution. The polymer solution is held in reservoir and propelled through a nozzle to create a continuous flow of polymer solution in the form of a stationary wave. The polymer solution flowing out of the nozzle returns to the reservoir, wherein it again will be sent through the nozzle. A substrate having a lower surface is moved over the stationary wave at a preselected rate such that the lower surface of the substrate contacts the stationary wave. A uniform film of polymer is coated on the lower surface of the substrate after the substrate has been moved over and passed the stationary wave.

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Patent Owner(s)

  • SYMBIOS LOGIC INC.;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Thornberg, Gary R Colorado Springs, CO 6 266

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