Slurry composition, polishing method using the slurry composition and method of forming a gate pattern using the slurry composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 18, 2007
Grant Date -
Jan 19, 2006
app pub date -
Jun 29, 2005
filing date -
Jul 15, 2004
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A slurry composition includes about 4.25 to about 18.5 weight percent of an abrasive, about 80 to about 95 weight percent of deionized water, and about 0.05 to about 1.5 weight percent of an additive. The slurry composition may further include a surfactant. In a polishing method using the slurry composition, a polysilicon layer may be rapidly polished, and also dishing and erosion of the polysilicon layer may be suppressed.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully