Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
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United States of America Patent
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Jun 26, 2007
Grant Date -
Mar 11, 2004
app pub date -
Sep 9, 2003
filing date -
Dec 20, 2000
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A structure and method are provided for correcting the optical proximity effects on a tri-tone attenuated phase-shifting mask. An attenuated rim, formed by an opaque region and an attenuated phase-shifting region, can be kept at a predetermined width across the mask or for certain types of structures. Typically, the attenuated rim is made as large as possible to maximize the effect of the attenuated phase-shifting region while still preventing the printing of larger portions of the attenuated phase-shifting region during the development process.
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