Method for forming micropatterns
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United States of America Patent
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May 29, 2007
Issued Date -
N/A
app pub date -
Feb 8, 2005
filing date -
Feb 16, 2001
priority date (Note) -
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Abstract
A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.
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