Performing optical proximity correction on trim-level segments not abutting features to be printed
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United States of America Patent
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Oct 26, 2004
Grant Date -
Apr 22, 2004
app pub date -
Oct 21, 2002
filing date -
Oct 21, 2002
priority date (Note) -
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Abstract
One embodiment of the invention provides a system that performs optical proximity correction (OPC) on selected segments on a trim mask used in fabricating an integrated circuit. Upon receiving the trim mask, the system identifies selected segments on the trim mask that do not abut any feature to be printed on the integrated circuit. Next, the system performs a number of OPC operations. The system performs a first OPC operation on the selected segments to correct the selected segments. The system also performs a second OPC operation to correct segments on the trim mask that do abut features to be printed on the integrated circuit. The system additionally performs a third OPC operation on an associated phase shifting mask to correct segments that abut features to be printed on the integrated circuit. (Note that the first, second and third OPC operations can be performed separately or at the same time.)
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