Exposure method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 7, 2006
Issued Date -
N/A
app pub date -
Jan 12, 2006
filing date -
Jun 4, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An exposure method that can conduct digital exposure with high precision and with a high light-use efficiency using evanescent light. Light that is modulated by a DMD and condensed by a microlens array is incident at corresponding optical fiber cores arranged in a matrix in an evanescent array head, and is guided through the insides of the optical fibers. Because the light condensed by the microlens array is incident at the optical fiber cores corresponding to the microlenses, the light can be efficiently incident. Evanescent light leaks out from micro-openings formed in emission-side end portions of the optical fibers, and a photosensitive material is exposed by this evanescent light.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully