Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate
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United States of America Patent
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Mar 24, 2009
Grant Date -
Jun 26, 2008
app pub date -
Dec 22, 2006
filing date -
Dec 22, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
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Cited Art Landscape
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