Plasma process monitoring device and plasma processing apparatus including the same

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United States of America Patent

PATENT NO 11862442
APP PUB NO 20190355559A1
SERIAL NO

16412818

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma process monitoring device capable of monitoring plasma light distributed in a certain area in a chamber includes a selection area light transmitter and a monitor. The selection area light transmitter is disposed to face a viewport formed in a chamber and includes a plurality of selective light blockers for selectively blocking plasma light emitted through the viewport. The monitor receives plasma light transmitted through at least one of a plurality of selective light blockers to acquire information on the plasma light, and monitors the uniformity of plasma generated in the chamber based on the information on the plasma light.

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Patent Owner(s)

  • INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yun, Il Gu Seoul, KR 3 1

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