Device and method for determining an illumination intensity profile of an illuminator for a lithography system
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United States of America Patent
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Apr 11, 2006
Grant Date -
Nov 3, 2005
app pub date -
Apr 28, 2004
filing date -
Apr 28, 2004
priority date (Note) -
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Abstract
A system and method for generating an illumination intensity profile of an illuminator that forms part of a projection lithography system. Radiation from the illuminator is projected towards an illumination profile mask having a plurality of apertures such that each aperture passes a distinct portion of the radiation. The intensity of each of the distinct portions of radiation is detected and assembled to form the illumination intensity profile.
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