Gas baffle and distributor for semiconductor processing chamber
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United States of America Patent
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Jun 22, 2010
Grant Date -
May 29, 2008
app pub date -
Nov 28, 2006
filing date -
Nov 28, 2006
priority date (Note) -
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Abstract
Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.
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