Developing apparatus and developing method
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United States of America Patent
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Nov 24, 2015
Grant Date -
Jul 14, 2011
app pub date -
Mar 22, 2011
filing date -
Feb 7, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
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