High Q planar inductors and IPD applications
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United States of America Patent
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May 11, 2010
Grant Date -
Jul 20, 2006
app pub date -
Jan 18, 2006
filing date -
Jan 20, 2005
priority date (Note) -
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Abstract
Disclosed is methodology and apparatus for producing a planar inductor having a high quality (Q) factor. The inductor is formed by providing a first, relatively wide coil turn, and at least a pair of relatively more narrow second coil turns, displaced in a different plane from that occupied by the first coil turn. The configuration of such coil turns produces a high value of mutual coupling among the coil turns, resulting in an inductor having a high quality (Q) factor.
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