Heat-developable photosensitive material

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4636462
SERIAL NO

06769288

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A heat-developable photosensitive material which contains a compound of the general formula: ##STR1## wherein F and F' each represents an atomic group necessary for the formation of a 5- or 6-membered rings which may have condensed rings; n represents an integer of 0 or 1; R.sup.1 and R.sup.2 which may be the same or different, each represents a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, or a substituted or unsubstituted alkyl group, cycloalkyl group, alkenyl group, alkynyl group, aryl group, heterocyclic residual group, aralkyl group, alkoxy group, aryloxy group, acylamino group, acyloxy group, acyl group, carbamoyl group, sulfamoyl group, sulfamoylamino group, ureido group, alkylsulfonyl group, arylsulfonyl group, alkylsulfonylamino group, arylsulfonylamino group, alkoxycarbonyl group or alkoxycarbonylamino group, or --CO.sub.2 M; and R.sup.1 and R.sup.2 may be combine and form a ring, M is an alkali metal or H.Bx in which B represents an organic base; and x represents an integer of 1 when B is a monoacidic base and represents 1/2 when B is a diacidic base.

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Patent Owner(s)

  • FUJI PHOTO FILM CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirai, Hiroyuki Kanagawa, JP 150 5638
Kawata, Ken Kanagawa, JP 101 1215
Sato, Kozo Kanagawa, JP 149 1587
Yabuki, Yoshiharu Kanagawa, JP 126 1303

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