Solution treatment apparatus and cleaning method

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United States of America Patent

PATENT NO 11868057
SERIAL NO

17485698

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Abstract

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A solution treatment apparatus applies a coating solution onto a substrate. The apparatus includes a holder holding and rotating the substrate; a coating solution supplier supplying the coating solution to the substrate on the holder; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate on the holder. The inner cup has discharge ports formed along a circumferential direction at the apex part; and the discharge ports are formed to discharge a cleaning solution and make the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning the peripheral edge side upper surface, and to discharge the cleaning solution outward in the radial direction and obliquely upward.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inada, Hiroichi Koshi, JP 31 568
Seki, Shinichi Koshi, JP 8 85
Shibasaki, Kenta Koshi, JP 9 19
Shimmura, Satoshi Koshi, JP 9 7
Takayanagi, Koji Koshi, JP 39 197
Teramoto, Akihiro Koshi, JP 17 59
Yada, Kenji Koshi, JP 7 16

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