Reflective mask blank and process for producing the reflective mask blank
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United States of America Patent
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Mar 27, 2018
Grant Date -
Mar 23, 2017
app pub date -
Sep 15, 2016
filing date -
Sep 17, 2015
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A reflective mask blank, which includes a substrate, a reflective multilayer film for reflecting exposure light, and an absorber layer for absorbing the exposure light in this order; the reflective multilayer film having at least three fiducial marks formed in a concave shape in an area outside an exposure area for patterning the reflective multilayer film on a front side thereof, each of the fiducial marks including a concave portion having an inclination angle α, the absorber layer having a film thickness of from 40 to 90 nm; the absorber layer having transferred marks formed in a concave shape on a front side thereof, the transferred marks being transferred from the at least three fiducial marks, each of the transferred marks including a concave portion having an inclination angle of from 35 to 80°; and a difference between the inclination angle β and the inclination angle α (inclination angle β−inclination angle α) being at least 10°.
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