Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
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United States of America Patent
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Oct 6, 2009
Grant Date -
Sep 11, 2008
app pub date -
Mar 7, 2007
filing date -
Mar 7, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between X and Y overlay measurements can therefore be avoided. The gratings may be directly overlying or off set so as to be interleaved in one or two directions.
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