Positive photosensitive composition and pattern-forming method using the same
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United States of America Patent
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Jun 14, 2011
Grant Date -
Sep 14, 2006
app pub date -
Mar 9, 2006
filing date -
Mar 11, 2005
priority date (Note) -
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Abstract
A positive photosensitive composition comprising: (A) a resin having at least one repeating unit having a specific lactone structure at a side chain and being capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a specific acid upon irradiation with an actinic ray or a radiation, and a pattern-forming method using the positive photosensitive composition, are provided.
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