CVD of conformal coatings over a depression using alkylmetal precursors

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United States of America Patent

PATENT NO 5462767
SERIAL NO

08139864

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A CVD method for forming a conformal coating over a depression or a cave in a top surface is disclosed, which comprises the steps of forming at least one depression or a cave in said top surface where at least a portion of the depression or the cave has an inner surface; providing a reactive precursor containing at least an alkyl metal compound; and CVD forming from a gas of said reactive precursor at least one metal-containing layer over said top surface and said depression or cave such that the ratio ds/dt of the thickness (ds) of the layer on the inner surafce of the depression or cave and the thickness (dt) of the layer on the top surface is substantially one.

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Patent Owner(s)

  • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inujima, Takashi Kanagawa, JP 35 1416
Yamazaki, Shunpei Tokyo, JP 7291 226813

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