Focused ion beam system with coaxial scanning electron microscope
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United States of America Patent
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May 31, 2005
Grant Date -
Jun 10, 2004
app pub date -
Aug 6, 2003
filing date -
Aug 7, 2002
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.
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