Positive photoresist composition containing a 2,4-dinitro-1-naphthol
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United States of America Patent
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Feb 17, 1998
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N/A
app pub date -
Aug 7, 1996
filing date -
Aug 7, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
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